1) ZnO/ Zn_2SiO_4/SiO_2
ZnO/Zn_2SiO_4/SiO_2
2) CuO/ZnO/SiO 2
CuO/ZnO/SiO_2
3) CuO-ZnO-SiO2
CuO-ZnO-SiO_2
6) ZnO/SiO2/Si layered structure
ZnO/SiO_2/Si结构
1.
Using ZnO/SiO2/Si layered structure, the monolithic integration of SAW device with electronic circuit can be realized.
ZnO/SiO_2/Si结构的SAW滤波器因其能够和其它电路集成而在RF领域受到越来越多的关注。
补充资料:silicic acid (h4sio4), tetraphenyl ester
CAS: 1174-72-7
分子式: C24H20O4Si
分子质量: 400.50
中文名称: 硅酸四苯酯
英文名称: Silicic acid, tetraphenyl ester;Tetraphenoxysilane;silicic acid (h4sio4), tetraphenyl ester;Silicic acid(H4SiO4),tetraphenyl ester;tetraphenyl orthosilicate;Silicic acid,tetraphenyl ester
分子式: C24H20O4Si
分子质量: 400.50
中文名称: 硅酸四苯酯
英文名称: Silicic acid, tetraphenyl ester;Tetraphenoxysilane;silicic acid (h4sio4), tetraphenyl ester;Silicic acid(H4SiO4),tetraphenyl ester;tetraphenyl orthosilicate;Silicic acid,tetraphenyl ester
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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