1) hadrons spectroscopy
强子激发谱
2) Strong electronic excitation effect
强电子激发效应
4) electronic emission and excitation spectra
电子发散和激发光谱
5) Particle induced X-ray emission spectrometry
粒子激发X射线光谱
6) XPS
X光激发电子能谱
1.
The interfacial structures of double interface system of Si_3N_4/SiO_2/Si were examined using XPS(X-ray Photoelectron Spectroscopy)before and after~(60)Co irradiation.
采用氩离子刻蚀XPS(X光激发电子能谱)分析对S i3N4/S iO2/S i双界面系统进行了电离辐照剖面分析。
2.
A depth profiles analysis of the irradiation effect of Si3N4/SiO2 doublegate medium under 60Coγ ray irradiation has been carried out by using the Xray photoemission spectroscopy (XPS) method, with Ar+ ion etching.
采用氩离子刻蚀X光激发电子能谱分析方法对Si3N4/SiO2/Si复合栅介质系统进行电离辐照剖析。
补充资料:晶体中的元激发(见固体中的元激发)
晶体中的元激发(见固体中的元激发)
elementary excitation in crystal
晶体中的元激发eleme讯ary excitation Incrvstal见固体中的元激发。
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条