1) photo-damage resistance ability
抗光损伤能力
1.
It can be derived from measurement made that the photo-damage resistance ability of Ce:Fe:LiNbO3 crystals become larger along with increased Li/Nb ratios and its enhancing mechanism is thus investigated.
测试了不同Li/Nb比Ce:Fe:LiNbO3晶体抗光损伤能力,得到随着Li/Nb比的增加,晶体的抗光损伤能力增加。
3) photo damage resistance
抗光损伤
1.
The OH - transmissive spectra,photo damage resistance,photo conductivities and the double frequency properties have been measured.
测试了晶体的红外透射光谱、抗光损伤能力、光电导和倍频性能。
2.
The photo damage resistance increases of two magnituder when the ZnO doping concentrations were higher than 6 mol%.
在ＬｉＮｂＯ３晶体中掺入ＺｎＯ，生长ＺｎＯ∶ＬｉＮｂＯ３晶体，当ＺｎＯ的掺入浓度高于６ｍｏｌ％时，晶体的抗光损伤能力提高两个数量级，与高掺ＭｇＯ（＞４。
4) abrasion resistance and cavitation erosion resistance
损伤抗力
6) hydrogen damage resistance
抗氢损伤性能
补充资料：继电保护设备抗干扰能力
继电保护设备抗干扰能力
interference withstand capability of protec-tive relays and relay systems
J一d一on boohu shebel kangganrao neng(-越电保护设t抗千扰能力(interfereneewithstand ea邵bility of proteetiverelay systems)relays and见变电所二次回路干扰。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条