1) W thin film
W膜
2) Cu-W thin film
Cu-W薄膜
1.
The surface morphology evolution and phase structures of Cu-W thin films with annealing temperatures were investigated.
提出了一种基于离散小波变换和分形几何概念定量描述薄膜表面形貌各向异性的新方法,并据此研究了磁控溅射Cu-W薄膜表面结构特征随退火温度的演变。
3) TiO_ 2-W thin films
TiO_2-W薄膜
4) W/ TiO2 thin film
W/TiO2薄膜
5) Cu-W thin films
Cu-W薄膜
1.
The evolution of surface morphology of Cu-W thin films with deposition time on silicon wafers was studied by discrete wavelet transform (DWT).
Cu-W薄膜在溅射时间超过600 s时才达到稳定。
6) Os-W/Re
Os-W/Re膜
1.
A new type dispenser cathode with Os-W/Re dual-layer has been developed.
研究了一种新型的覆膜钡钨阴极——双层膜(Os-W/Re膜)钡钨阴极。
补充资料:i-c膜
分子式:
CAS号:
性质:见类金刚石膜
CAS号:
性质:见类金刚石膜
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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