1) ZnO/SiO 2/Si structure
ZnO/SiO2/Si结构
2) ZnO/SiO2/Si layered structure
ZnO/SiO_2/Si结构
1.
Using ZnO/SiO2/Si layered structure, the monolithic integration of SAW device with electronic circuit can be realized.
ZnO/SiO_2/Si结构的SAW滤波器因其能够和其它电路集成而在RF领域受到越来越多的关注。
3) ZnO/Si heterostructure
ZnO/Si异质结构
4) Cu/Ta/SiO_2/Si multilayer
Cu/Ta/SiO2/Si多层膜结构
1.
Nanoindentation was adopted to investigate the compound hardness and elastic modulus of Cu/Ta/SiO_2/Si multilayer thin film system,which is a typical structure widely used in the manufacture of integrated circuit.
Cu/Ta/SiO2/Si多层膜结构是目前集成电路制造工艺中的常见结构,其硬度与弹性模量通过纳米压入技术测得。
6) SiO_2/Si
SiO2/Si
1.
The stress distribution of a SiO_2/Si waveguide during different sintering step is analyzed theoretically using the finite element method.
采用有限元法对SiO2/Si掩埋光波导制备工艺中的应力变化进行了系统的分析,在此基础上,应用有限差分束传播法(FDBPM)对应力光波导的双折射进行了计算。
补充资料:iron zinc oxide (fe2zno4)
CAS:12063-19-3
分子式:Fe2ZnO4
中文名称:氧化铁锌
英文名称:Iron zinc oxide;iron zinc oxide (fe2zno4);diiron zinc tetraoxide
分子式:Fe2ZnO4
中文名称:氧化铁锌
英文名称:Iron zinc oxide;iron zinc oxide (fe2zno4);diiron zinc tetraoxide
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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