1) optimal deposition rate
优化淀积率
2) deposition rate
淀积速率
1.
Two important parameters in the process of laser induced plasma chemical vapor deposition film size and deposition rate are deduced with shock wave theory The influence of laser intensity,atmosphere and pedestal temperature on the deposition process is analyse
用激波理论推出了激光诱导等离子体化学气相淀积过程中两个重要参量薄膜面积、膜淀积速率的表达式。
2.
A time\|dependent model for deposition rate is presented which includes two parameters of the process: the ion beam s dwell time and its loop time.
Meyer离子与表面吸附气体相互作用模型的基础上 ,提出了聚焦离子束辅助淀积的淀积速率模型 。
3) cultural accumulation
文化积淀
1.
From the angle of cultural accumulation,the paper analyses the innovative spirit of Du Jinsheng,founder of Du Jinsheng Silk Knitting Factory,to demonstrate his broad-minded national integrity of discovering and making use of the cultural essence of the East and the West.
从文化积淀及世界视野这一视角,对都锦生丝织厂的创始人都锦生的创新精神进行分析,以彰显其博采东西文化精华之开阔的世界视野。
2.
The editing is a social work involving creativity and imagination, whose work task is to add to the cultural accumulation.
编辑工作是一种具有创意的社会工作 ,它的职责在于文化积淀与传播 ,是一种功在当代 ,泽被后世的创造性劳动。
3.
Taking “cultural miner”for his bounden,XiaYing(Song Tiancang) goes on digging the profound cultural accumulation, offers readers the realization of life and delicate works which show an interesting new approach, ingeniously conceived plot and vivid picture.
夏影(宋天仓 )以“文化矿工”为天职 ,对开封深厚的文化积淀挖掘不止 ,以生命的感悟与精致的美文奉献给读者。
4) electroless processing
化学淀积
5) upper limite of deposition rate
淀积率上限
6) optimization of co-precipitation
共沉淀优化
补充资料:化学气相淀积(chemicalvapourdeposition(CVD))
化学气相淀积(chemicalvapourdeposition(CVD))
化学气相淀积是一种气体反应过程。在这个过程中,由某些选定气体的热诱导分解在衬底上形成某种介质层。在硅平面器件及集成电路中最常用的是淀积SiO2,Si3N4和多晶硅。化学气相淀积也广泛用于半导体单晶薄膜的外延生长,特别是多层膜的外延生长。在光电子器件和微波器件的制作中尤其常用。CVD方法视工作时反应室中气体压强不同分为常压、低压和超低压CVD。根据化学反应能量提供方式不同可分为热分解、光加热、射频加热、热丝、光、等离子体增强和微波等离子体增强CVD。按反应气源不同又分为卤化物、氢化物和金属有机化合物CVD(MOCVD)。
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条