1) field emission arrays
场致发射阵列阴极
1.
Low emission and emission instability are still two main obstacles in applying field emission arrays by micro-manufacture and thin-film technology to actual devices.
在利用微细加工技术和双向薄膜沉积工艺制得的钼尖锥场致发射阵列阴极进行实用化的过程中,目前存在的两个主要障碍是,阴极发射电流密度低和工作不稳定。
2.
The analysis showed that the main trouble of employing a field emission arrays(FEA) electron gun in microwave tube could be attributed to the defocus of electron beam.
通过比较场发射电子注聚焦的几种方法 ,利用传统电子枪整体聚焦的思想 ,初步设计了一个场发射阵列阴极电子枪模型 ,它包括场致发射阵列阴极 ,一个Whelnelt电极 ,一个聚焦电极和一个阳极。
2) field emission cathode array
场致发射阴极锥尖阵列
3) field emission array cathode
场发射阵列阴极
1.
Aiming at those problems, a new type of LaB6-FEA was fabricated in this paper by using unique emitter material and fabricating technique, in order to improve the emission performance of traditional field emission array cathodes.
目前场发射阵列阴极的不足主要表现在大面积阴极发射电流密度和发射稳定性还达不到实用要求。
5) Field emission arrays cathode
场发射阵列冷阴极
6) Field Emitter Array(FEA)
场致发射阵列
补充资料：库鲁发射场(见航天器发射场)
库鲁发射场(见航天器发射场)
Kourou Launching Site
Kulu Fashechang库鲁发射场(Kourou Laune址ng site)见航天器发射场。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条