1)  GaAs:Gd
GaAs:Gd
2)  GaAs:Gd film
GaAs:Gd薄膜
1.
GaAs∶Gd film was fabricated on GaAs (100) substrate by ion beam epitaxy technique at room temperature.
　室温条件下,用低能离子束外延制备了GaAs∶Gd薄膜,X射线衍射(XRD)结果表明除了GaAs衬底峰没有发现其它新相的衍射峰,并借助于高分辨X射线衍射(HR XRD)进一步分析了晶格常数的变化特点。
3)  Gallium
Ga
1.
Density and Viscosity of Gallium Melt and Its Microstructure;
液态Ga的密度和黏度及其微观结构
2.
Gallium bearing ferrites with different gallium content were synthesized by oxidation of ferrous and gallium ions under alkaline condition and room temperature.
采用氧化-沉淀法在室温下合成了不同Ga含量的Ga取代磁铁矿,并对上述产物进行了IR,XRD,Mossbauer等谱学解析和磁滞回线的测量。
3.
The adsorption behavior of nanometer TiO_2 towards Gallium (Ga) Indium (In) and Thallium (Tl) was investigated with inductively coupled plasma atomic emission spectrometry (ICP-AES).
研究了纳米TiO2材料对Ga,In,Tl的吸附性能,考察了吸附动力学、最佳酸度、富集倍数和吸附容量,确定了待测金属离子的最佳吸附条件。
4)  Ga
Ga
1.
Influences of Gallium on Microstructure and Mechanical Properties of Mg-x%Al-2%Ga Alloys;
Ga对铸态Mg-x%Al-2%Ga镁合金显微组织和力学性能的影响
2.
Preliminary Feasibility Study of Extracting Ga、Nb、Li and Sc from Bauxite Ore;
从铝土矿中提取Ga、Nb、Li、Sc的可行性初步研究
3.
Effects of Ga on electrochemical properties of Al-Zn-In sacrificial anodes;
Ga对Al-Zn-In合金牺牲阳极电化学性能影响
5)  Ga-In-As
Ga-In-As
1.
THERMODYNAMICS OF Ga-In-As SYSTEM UNDER LATTICE DEFORMATION;
晶格形变情况下Ga－In－As体系热力学研究
6)  GaAs
Ga As
1.
Interference of Electron in GaAs/AlGaAs Multiquantum Well Structure;
Ga As/Al Ga As多量子阱结构中的电子干涉
参考词条
补充资料：GaAs epitaxial wafer
分子式：
CAS号：

性质：在特定晶向[(100)或(100)偏向最近<110>2 ～5 的晶面]砷化镓衬底上外延生长的单晶薄层材料外延工艺有LPE、VPE、MOCVD、MBE、CBE、ALE等工业选择取决于器件结构等因素，一般LPE、VPE多用于商品化器件，如光探测器、霍尔器件等。MBE、CBE、ALE多用于最子阱超晶格材料。MOCVD两方面兼而有之。

说明：补充资料仅用于学习参考，请勿用于其它任何用途。