1) single photo-exposure process
一次性光致曝光工艺
2) single-exposure
一次曝光
1.
True color hologram making by single-exposure of one-wavelength laser;
单色激光一次曝光记录真彩色全息图
3) one short dual energy
双能量一次曝光
1.
This paper introduces principles of one short dual energy subtraction, a technique of CR (Computed Radiography).
介绍了双能量一次曝光法能量减影的基本原理，阐述了采用此技术进行选择性地提取人体肺部骨组织和软组织的理论基础，说明了应用软件方法实现能量减影的具体步骤，其中包括通过散射校正和硬化校正等提高处理质量的过程，最后给出了实验结果，并用三维曲面图加以分析。
4) Second exposure
二次曝光
1.
s:This paper intruduces a method of determination of matter refractive index from the speckle patten obtained by second exposure.
介绍了一种根据利用二次曝光技术获得的斑纹图样的光学特性测物质折射率的方法。
5) double-exposure
二次曝光
1.
It discusses the required theory to study the stress field of the diffuser with double-exposure holographic interferomentry from tow ways.
从两个方面论述二次曝光全息技术研究应力场实验所需要的理论基础,第一个方面是论述全息照相技术的理论基础,第二个方面是论述了全息干涉计量学的相关理论,重点阐述二次曝光全息计量和漫射体全息干涉计量的基本理论。
2.
In double-exposure method for fabricating chirped fiber Bragg gratings, the mul ti-decaying-exponential relationship between photo-induced index increment of photosensitive fiber and its irradiating dose was considered and our self-desig ned software calculated nonlinear doubl-exposure profiles.
在利用二次曝光技术制作啁啾光纤Bragg光栅的方法中,把曝光扩大到光敏光纤感光特性曲线的非线性区,使得二次曝光法制作的啁啾光纤Bragg光栅的带宽和反射率大大提高。
6) Double exposure
二次曝光
1.
The double exposure fractional Fourier transform hologram (D EFRTH) is presented and analyzed in the paper.
提出了二次曝光分数傅里叶变换全息图 ,分析了它的性质 ,制作了二次曝光分数傅里叶变换全息图 ,讨论了其再现条件的特殊性和它的应
2.
By adopting double exposure technique, with a uniform phase mask and Gaussian laser beam being used, the uniform FBG used in DWDM system is designed and engraved, where, the bandwidth of the main reflection band at -50 dB is about 0.
采用高斯光束和均匀相位模版 ,用二次曝光技术 ,有效消除了均匀光纤光栅的反射谱旁瓣 ,所设计和刻制的光栅完全满足DWDM系统的要
3.
A method of single sensitivity is proposed to the displacement s measurement of double exposure.
提出一种单灵敏度下的二次曝光测位移。
补充资料：光致致
1.有光泽而细腻貌。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条