1) Back CMP cleaning
无应力抛光
4) polishing force
抛光力
1.
This paper deals with the analysis and measurement of applied foroes between polishing plate and work holder,and makes an investigation on how to control and measure the polishing force.
分析与测量了抛光模与工件盘之间的抛光力，并对如何控制与测量进行了研究。
5) polishing pressure
抛光压力
6) press plish
压力抛光
补充资料：抛光剂,抛光混合剂
CAS：68909-13-7
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条