1) annular lapping technology
环行浮动抛光技术
2) float polishing
浮动抛光
3) polishing technology
抛光技术
1.
With advancing of fabricate technology,to develop the effectiveness of polishing,Many new kinds of combined polishing technology were applied,such as Chemical-Mechanical Polishing (CMP),electrochemical-mechanical polishing,ultrasonic wave-electrochemical polishing,magnetism-electrochemical polishing and so on.
随着生产技术的不断进步,为了提高抛光效果,出现了化学-机械抛光(Chemical-Mechanical Polishing,简称CMP)、电解-机械抛光、超声波-电解抛光、磁力-电解抛光等多种复合抛光技术。
4) floating technique
浮动技术
1.
Aim\ To research the use of floating technique on the large clibre machine gun and analyze the influence of parameters on the floating stability.
目的 对浮动技术在大口径机枪上的应用进行研究 ,并对影响浮动稳定性的设计参数进行分析 。
5) Laser polishing technology
激光抛光技术
6) ultrasonic float polishing
超声浮动抛光
1.
Research on large diameter silicon surface grinding using ultrasonic float polishing;
超高精度大直径硅片表面超声浮动抛光
补充资料：抛光剂,抛光混合剂
CAS：68909-13-7
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条