1) Automatic brackeeing control
括弧式曝光
2) Exposure mode
曝光方式
4) proximity exposure
接近式曝光
1.
A x-y 2 dimension precision motion stage used in proximity exposure system was developed to meet the demand of manufacturing micro-optical elements by mask moving exposure technique.
为满足掩模移动曝光技术制作微光学元件的要求,研制了接近式曝光系统中使用的x-y二维精密移动工件台。
2.
The history and recent advances of this technology are reviewed, especially emphasis on important technical accomplishments and challenges in X ray sources, proximity exposure and all reflective projection lithography.
重点讨论了在Ｘ射线源、接近式曝光和全反射投影曝光等方面取得的成就与存在的问题。
5) roll exposure
滚筒式曝光
1.
Aiming at the roll exposure for CMOS image sensor,a multi-time exposure mode is proposed to improve dynamic range through fitting the curve of output characteristic and also to optimize image quality by improving the smoothness of curve.
针对CMOS图像传感器滚筒式曝光模式,研究采用多种曝光时间,实现多线段拟合像素输出特性曲线,扩展传感器的动态范围,并改善其平滑性,提高图像清晰度;应用电源保护环、像素二次采样等方法消噪。
补充资料：括弧
①小括号。参看 〖括号〗①。②括号②。有时也指引号。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条