1) W-clading
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W 镀层
1.
Test results show that inte-rface reaction between W-clading and diamond occur at between 700~1250℃,the epitaxial islands of WC and W_2C are formed and grow on the diamond su-rface,therfore metallurgical bond of interface between diamond and copperaclloy is achieved.
结果表明:在700~1250℃范围内,镀 W 层与金刚石发生界面反应,在金刚石表面外延生成岛状 WC 和 W_2C 从而实现了金刚石与 W 镀层间的冶金结合,即金刚石表面金属化。
3) Ni-W-P coating
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Ni-W-P镀层
4) Ni-W alloy coatings
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Ni-W合金镀层
1.
The effect of Tungsten on the microstructure of Ni-W alloy coatings prepared by the pulse electrodeposition technology is firstly investigated by X-ray Diffraction.
利用脉冲电沉积的方法制备了Ni-W合金镀层,在微观形貌上与用直流电沉积方法得到的镀层进行比较。
2.
Ni-W alloy coatings are prepared by pulse electrodeposition.
![点击朗读](/dictall/images/read.gif)
利用脉冲电沉积方法制备了Ni-W合金镀层,观察了该镀层在不同载荷下的摩擦磨损行为,探讨了该合金镀层的摩擦磨损机理,并与45钢进行了对比试验。
3.
Ni-W alloy coatings with excellent hardness, wear resistance and appearance produced by electrodeposition were introduced in this dissertation.
本文用电沉积方法制备了具有良好硬度、耐磨性和外观质量的Ni-W合金镀层。
5) Ni-Fe-W alloy coatings
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Ni-Fe-W合金镀层
1.
A new Ni-Fe-W alloy coatings were obtained by pulse electrodeposition,the effect of W in the electrolyte contents on the structure of coatings,and the effect of the electrolyte contents on the hardness and thickness of coatings were discussed.
利用脉冲电沉积的方法制备了Ni-Fe-W合金镀层,讨论了镀液中W的含量对Ni-Fe-W合金镀层组织结构的影响,以及镀液成分对镀层硬度及厚度的影响。
2.
Then,the effects of the concentration of NiSO_4·6H_2O、Na_2WO_4·2H_2O、FeSO_4·7H_2O and temperature on the quality of Ni-Fe-W alloy coatings are also addressed.
并采用正交实验的方法研究了主盐浓度以及温度对脉冲电沉积Ni-Fe-W合金镀层的影响,通过对硬度、沉积速度以及外观的分析,筛选出了最佳的工艺条件。
6) Ni-W-P alloy coating
![点击朗读](/dictall/images/read.gif)
Ni-W-P合金镀层
1.
Study on the properties of Ni-W-P alloy coating;
![点击朗读](/dictall/images/read.gif)
Ni-W-P合金镀层性能研究
2.
The test results show that the Ni-W-P alloy coatings adhere to the substrate very well and have no pore when coating thickness reaches 15μm.
93wt%的Ni-W-P合金镀层。
补充资料:磁性镀层
分子式:
CAS号:
性质:用于提高某些金属或非金属零件的磁性要求的电镀层。如录音机或电子计算机等设备中的录音带、磁环线、记忆鼓等储存系统,一般镀镍铁、镍钴、镍铬磷等合金。通过改变电镀工艺参数,可获得不同性能的磁性镀层。
CAS号:
性质:用于提高某些金属或非金属零件的磁性要求的电镀层。如录音机或电子计算机等设备中的录音带、磁环线、记忆鼓等储存系统,一般镀镍铁、镍钴、镍铬磷等合金。通过改变电镀工艺参数,可获得不同性能的磁性镀层。
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条