1) silicon films
硅膜
2) Silane film
硅烷膜
1.
Piezoelectric sensing monitor of surface adsorption characteristic of protein on silane film;
蛋白质在硅烷膜表面吸附特性的压电传感监测
2.
Two types of protective silane films, bis-1, 2-[triethoxysilyl] ethane (BTSE) and dodecyltrimethoxysilane (DTMS), were deposited on LY12 aluminum alloys with aiding of electrochemical technique.
采用电化学辅助技术在LY12铝合金表面沉积了两种防护性硅烷膜(1,2-二-(三乙氧基硅基)乙烷(BTSE)膜与十二烷基三甲氧基硅烷(DTMS)膜)。
3.
Thus the steel sheet was coated with molybdate conversion film as the inner layer and silane film as the top layer.
对热镀锌钢板钼酸盐转化后再浸涂一层硅烷膜,获得了钼酸盐/硅烷复合膜。
3) silicon thin film
硅薄膜
1.
Stability of mixed phase silicon thin film material under light soaking;
相变域硅薄膜材料的光稳定性
2.
Different structural silicon thin films deposited by very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) were studied at the use of purifier or not.
本文采用VHF PECVD技术制备了不同结构的硅薄膜 ,分析研究了有、无纯化器对制备薄膜特性的影响。
3.
Through scanning electronic microscopy(SEM) measurement,the morphologies of silicon thin film were investigated.
用射频等离子体增强化学气相沉积(RF-PECVD)系统在普通玻璃衬底上制备了氢化非晶硅薄膜(a-Si∶H),用改进的快速光热退火炉(RTP)对薄膜进行了低温下的退火处理。
4) silica membranes
氧化硅膜
1.
The ordered silica membranes supported by α-alumina hollow fibers was prepared from copolymer plutonic P123 and TEOS.
本文介绍了在α-Al2O3中空纤维载体上制备担载有序氧化硅膜的方法。
5) silicon membrance
多孔硅膜
6) Co-Si thin films
钴硅薄膜
补充资料:氮化硅膜
分子式:
CAS号:
性质: 硅氮化合物的薄膜。可用化学气相沉积和溅射法制备,通常采用等离子体化学气相沉积(PCVD)制备,沉积温度低于300℃。由于Si3N4具有高硬度(块体硬度HV l7.2GPa)和优良的化学稳定性,它是很受重视的耐磨抗蚀膜,常用作微电子技术电绝缘层。但因Si3N4膨胀系数低,当沉积在金属基材上时,产生较大的界面应力,对基体附着差。
CAS号:
性质: 硅氮化合物的薄膜。可用化学气相沉积和溅射法制备,通常采用等离子体化学气相沉积(PCVD)制备,沉积温度低于300℃。由于Si3N4具有高硬度(块体硬度HV l7.2GPa)和优良的化学稳定性,它是很受重视的耐磨抗蚀膜,常用作微电子技术电绝缘层。但因Si3N4膨胀系数低,当沉积在金属基材上时,产生较大的界面应力,对基体附着差。
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参考词条