1) chemical wet etch
化学湿刻
2) wet chemical etching
湿法化学刻蚀
3) selective wet chemical etching
化学湿法刻蚀
4) chemistry etching
化学蚀刻
1.
In this paper, a generated method of 2-D binary phase grating by chemistry etching is presented.
本文介绍用化学蚀刻的方法制作二维二元位相光栅。
5) chemical etching
化学刻蚀
1.
A simple chemical etching method was developed for fabricating the super-hydrophobic surface on polycrystalline aluminum alloy.
采用简单化学刻蚀的方法制备出多晶铝合金基体上的超疏水表面。
2.
By using effective chemical etching and scavenging system(HNO 3+NaOH) and the optimized experimental parameters, such as the etching time, etching current density, concentration of etchant or scavenger, the etched patterns were obtained, which is close to negative copy of the mold.
运用约束刻蚀剂层技术 (CELT)在金属铜 (Cu)表面实现了三维微图形加工 ,取得成功的关键因素在于寻找到能对Cu进行有效CELT加工的化学刻蚀和捕捉体系。
3.
In this work,the techniques of the electrochemical etching and the chemical etching have been developed for the titanium surface modification.
发展电化学刻蚀和化学刻蚀技术,对钛表面进行处理,并应用扫描电镜、X射线衍射方法对其表面进行表征,探讨电化学刻蚀钛表面形成微观结构的机理。
6) chemical etch
化学蚀刻
1.
An easy-to-perform chemical etch method with a good repeatability was studies based on discussions of color metallography and its developments.
对易获得重现性好的化学蚀刻法进行了探研。
2.
The depth distribution of tritium in stainless steel was measured by chemical etching.
采用化学蚀刻法测定了氚在不锈钢材料中的纵向分布。
补充资料：光电化学刻蚀
分子式：
CAS号：
性质：在光照射下，半导体基质在与其相接触的电解质溶液中的溶蚀过程。这种技术用于半导体表面的光学制版工艺中。
CAS号：
性质：在光照射下，半导体基质在与其相接触的电解质溶液中的溶蚀过程。这种技术用于半导体表面的光学制版工艺中。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条