1) thermal laser polishing
激光热抛光
2) Laser polishing
激光抛光
1.
Development and expectation of laser polishing technology;
激光抛光技术的发展与展望
2.
The principle and affecting factors of laser polishing of diamond films are disc ussed.
讨论了激光抛光金刚石膜机理、影响因素 ,分析了激光抛光金刚石膜理论模型、激光抛光后金刚石膜的粗糙度极限 ,提出要实现金刚石膜特别是厚膜的精密抛光须考虑激光辅助复合抛光或其它抛光工艺。
3.
Several factors affect the material removal rate of laser polishing process and polished surface roughness, such as laser energy density, wavelength, pulse width, incidente angle, scanning speed and scanning way of laser beam, material properties and structure and so on.
激光抛光是一种非接触式抛光方法。
3) cooling laser polishing
激光冷抛光
5) Laser polishing technology
激光抛光技术
6) thermo-chemical polishing
热铁板抛光
1.
The first domestic thermo-chemical polishing apparatus is setup.
研制成功国内第１台大面积ＣＶＤ金刚石膜热铁板抛光机。
补充资料：抛光剂,抛光混合剂
CAS：68909-13-7
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条