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1)  polish grinding head
抛光磨头
1.
Based on a new polish grinding head structure and spot running characteristic,through analysing its lubricating mechanics,combined with large quantity spot lubricating experiments,an effective lubricating mode was generalized.
基于新型抛光磨头的结构及现场工作特性,通过对其润滑机理的分析研究,结合现场大量润滑实验,总结得出抛光磨头工作时最有效的润滑方式,可提高抛光磨头的工作寿命,大大减少了设备的投资,降低了成本。
2)  corrective polishing with small-tools
小磨头修正抛光
1.
A two-process polishing approach which combined with pre-polishing with large flexible form tools and corrective polishing with small-tools is introduced to polish aspheric surface with middle aperture.
介绍了一种弹性模抛光与小磨头修正抛光相结合的两步研抛法实现中等口径光学非球面表面的快速抛光。
3)  Computer controlled optical surfacing (CCOS)
小磨头数控抛光
4)  Silicone points polish
硅研磨头抛光
1.
Silicone points polishing significantly reduced PI 12 weeks after scaling.
评价超声洁牙后使用硅研磨头抛光对菌斑指数和龈沟出血指数的影响。
5)  polishing [英]['pɔliʃ]  [美]['pɑlɪʃ]
抛光;磨光
6)  burnishing [英]['bə:niʃ]  [美]['bɝnɪʃ]
磨光(抛光)
补充资料:抛光剂,抛光混合剂
CAS:68909-13-7
中文名称:焙烧提浓的氟碳铈镧矿;抛光剂,抛光混合剂
英文名称:Bastnaesite, calcined concentrate;Calcined bastnasite;bastnaesite, calcined conc.;polishing compound;Bastnaesite,calcined concentrate
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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