The influence of P(O2) on the construction of ZnO thin films was investigated.

Influence of bias voltage on morphology,phase and wear performance of magnetron sputtered CrTiAlN coatings;

Effect of bias voltage on morphology and performance of magnetron sputter ion plating graphite-like carbon coatings;

Effect of bias voltage on the formation of CN_x films in hollow cathode type discharge plasma sputtering techniques;

Effect of bias on composition and microstructure of Zr-Si-N diffusion barrier;

The Effect of Working Gas and Bias on Preparation of Fe containing Polymer Composite Films;

Effect of bias on texture growth of MPCVD diamond films;

Optimum analysis on the initial support structure of double-arch tunnel in partial pressure;

The study indicates that:1)asymmetrical excavation is the key cause of partial pressure in the mid-leading wall and the c.

Construction mechanics caused by different construction procedures under different slope angle of surface ground are analyzed based on a plain strain problem using Druck-Prager yield law in a partial pressure double-arch tunnel.