1) photoetching
光刻蚀
2) Photolithographic method
光刻蚀法
3) laser ablation
激光刻蚀
1.
A Study on PVP and PVK by Surface Enhanced Raman Spectra and the Preparation of Metal Colloids by Laser Ablation;
聚乙烯吡咯烷酮和聚乙烯咔唑的表面增强拉曼光谱研究及激光刻蚀金属胶体的制备
2.
The influences of laser ablation processes on the solubility and the crystallizability of laser evaporated Al2O3-ZrO2 nanopowders were studied by X-ray diffractometer (XRD), X-ray absorption fine structure (XAFS) spectroscope and high resolution electron microscope (HREM).
利用X射线衍射, X射线吸收精细结构谱和高分辨电镜研究了激光刻蚀工艺对 Al2O3-ZrO2固溶度和结晶度的影响。
3.
The micrometer-scaled channels with different width and depth on the Si surface were prepared by pulse laser ablation.
因此,利用激光刻蚀表面方法可以在一定程度上调控固体表面的润湿性能。
4) laser etching
激光刻蚀
1.
Surface treatments in liquid phase using laser-laser plating and laser etching were reviewed.
对液相中的激光表面处理－ 激光电镀和激光刻蚀进行综述，阐述了有关原理和应用。
5) near field photolithography
近场光刻蚀
6) chemical polish etching
化学抛光刻蚀
参考词条
补充资料：光刻蚀
分子式：
CAS号：
性质：用照相制版的方法，将光敏高分子制成一定图形的抗蚀性膜，再用化学或电化学方法进行腐蚀或电镀的过程。如印刷线路铜版的制作。
CAS号：
性质：用照相制版的方法，将光敏高分子制成一定图形的抗蚀性膜，再用化学或电化学方法进行腐蚀或电镀的过程。如印刷线路铜版的制作。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。