1) Bi_2O_3-SiO_2 system
Bi_2O_3-SiO_2系统
2) bismuthous oxide-silica system
氧化铋-氧化硅(Bi_2O_3-SiO_2)系统
3) Si-SiO2 system
Si-SiO_2系统
5) Si/SiO_2 system
Si/SiO_2系统
1.
H_2, O_2 RF(radio frepuency) plasma annealing as a function of pressure, tempera-ture, and time is studied in detail when the Si/SiO_2 system is radiated by O_2 plasma.
本文详细地研究了氧等高离子体造成辐照损伤的Si/SiO_2系统在氢、氧等离子体退火中随压强、温度及退火时间的变化关系。
6) BaO-Al_2O_3-SiO_2 system
BaO-Al_2O_3-SiO_2系统
补充资料：acetic acid, dianhydride with silicic acid (h4sio4) bis(1,1-dimethylethyl) este
CAS：13170-23-5
分子式：C12H24O6Si
分子质量：292.40
沸点：102℃(5 t
中文名称：二叔丁氧二乙酰氧基硅
英文名称：Acetic acid, dianhydride with silicic acid bis(1,1-dimethylethyl) ester
di-tert-Butoxydiacetoxysilane
di(tert-butoxy)diacetoxy-Silane
acetic acid, dianhydride with silicic acid (h4sio4) bis(1,1-dimethylethyl) este
di-t-butoxydiacetoxysilane
Acetic acid,dianhydride with silicic acid bis(1,1-dimethylethyl)ester
Silane,di(tert-butoxy)diacetoxy-
分子式：C12H24O6Si
分子质量：292.40
沸点：102℃(5 t
中文名称：二叔丁氧二乙酰氧基硅
英文名称：Acetic acid, dianhydride with silicic acid bis(1,1-dimethylethyl) ester
di-tert-Butoxydiacetoxysilane
di(tert-butoxy)diacetoxy-Silane
acetic acid, dianhydride with silicic acid (h4sio4) bis(1,1-dimethylethyl) este
di-t-butoxydiacetoxysilane
Acetic acid,dianhydride with silicic acid bis(1,1-dimethylethyl)ester
Silane,di(tert-butoxy)diacetoxy-
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条