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1)  optical-damage-resistance
抗光伤
2)  photo damage resistance
抗光损伤
1.
The OH - transmissive spectra,photo damage resistance,photo conductivities and the double frequency properties have been measured.
测试了晶体的红外透射光谱、抗光损伤能力、光电导和倍频性能。
2.
The photo damage resistance increases of two magnituder when the ZnO doping concentrations were higher than 6 mol%.
在LiNbO3晶体中掺入ZnO,生长ZnO∶LiNbO3晶体,当ZnO的掺入浓度高于6mol%时,晶体的抗光损伤能力提高两个数量级,与高掺MgO(>4。
3)  photodamage resistance thresholds
抗光损伤阈值
4)  laser anti-damage coatings
激光抗损伤薄膜
5)  laser induced damage threshold
抗激光损伤阈值
1.
Present status of study on dielectric coating highly reflective is introduced with emphasis laid on the focal points and some important achievements in the field of design principle,manufacturing methods,performance measurement and laser induced damage threshold.
介绍了近年来全介质高反膜 (highlyreflectivecoating)的研究现状 ,重点综述了设计原理、制备技术、性能检测以及抗激光损伤阈值方面的研究热点和重要成果 ,最后讨论了在现有条件下进一步提高高反膜性能的可能
2.
The laser induced damage threshold of optical films has the high meaning to the laser technology.
光学薄膜的抗激光损伤阈值对激光技术而言具有重大的意义。
6)  photo-damage resistance ability
抗光损伤能力
1.
It can be derived from measurement made that the photo-damage resistance ability of Ce:Fe:LiNbO3 crystals become larger along with increased Li/Nb ratios and its enhancing mechanism is thus investigated.
测试了不同Li/Nb比Ce:Fe:LiNbO3晶体抗光损伤能力,得到随着Li/Nb比的增加,晶体的抗光损伤能力增加。
补充资料:干膜光致抗蚀剂
分子式:
CAS号:

性质: 将无溶剂型光致抗蚀剂涂在涤纶片基上,再覆上聚乙烯薄膜。使用时揭去聚乙烯薄膜,把干胶层压在版基上,经曝光显影处理,即可形成图像。主要是利用多官能团的丙烯酸酯类单体或带双键的丙烯酸酯光敏树脂在光引发剂存在下,由光引发聚合反应产生交联结构而达到成像目的。多用于印刷线路板等的生产。

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