1) Ni MoS 2
Ni-MoS2
2) (Ni-Co-P)-MoS_2
(Ni-Co-P)-MoS2
3) Ni-P-MoS_2
Ni-P-MoS2
4) Ni/MoS_2 coating
Ni/MoS2涂层
1.
The dry sliding wear and friction behavior and mechanism of four kind of Ni/MoS_2 coating with different MoS_2 content by plasma-spraying were tested and investigated.
对等离子喷涂的四种不同MoS2含量的Ni/MoS2涂层的干滑动摩擦磨损性能和机制进行了试验和探讨。
5) phosphorus modified Ni/MoS2
P改性Ni/MoS2
1.
By effect of ultrasonic waves,premonitory LixMoS2 and phosphorus modified Ni/MoS2 composite were prepared by n-butyl lithium intercalating in the MoS2 layers,using the single-molecular-layer exfoliated-restacked technology.
实验结果表明,P改性Ni/MoS2催化剂具有很强的加氢脱硫、脱氮活性和选择性,P元素的最佳添加量为2。
6) molybdenum disulfide
MoS2
1.
NH+4/molybdenum disulfide intercalated material was prepared by the exfoliation and restacking process.
以剥层重堆法制备了NH+4/MoS2插层复合物,该复合物可以作为长期储存的单层MoS2,同时也可作为先驱体以便插入其它客体分子制成新的插层复合物。
2.
Based on the exfoliation/restacking properties of LiMoS_2, several intercalation compounds of molybdenum disulfide with rich photic, electrical, magnetic, thermal and catalytical properties have been prepared.
MoS2为层状结构固体,基于LiMoS2的可剥离/重堆性,人们制备出了一系列MoS2的夹层化合物,这类材料具有丰富的光、电、磁、热、催化等性能。
补充资料：E/D MOS电路
见增强型与耗尽型金属-氧化物-半导体集成电路。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条