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1)  metal contaminated sediment
金属沾污沉积物
2)  metal contamination
金属沾污
1.
The maximum metal surface concentration is controlled at about 10 12 cm -2 level in order to simulate metal contamination during ultra clean processing.
采用可控的金属沾污程序 ,最大金属表面浓度控制在 10 1 2 cm- 2数量级 ,来模拟清洗工艺最大可能金属沾污表面浓度 。
2.
The Surface Photovoltage (SPV) method, which can be used to detect the minority carrier diffusion length,lifetime, and heavy metal contamination level accurately, is an effective technique of high sensibility and no destruction to monitor the characteristics of the wafer in line and is also an effective method to exam the quality of devices in IC manufacturing.
能精确测量硅片的少子扩散长度、少子寿命、重金属沾污浓度等参数。
3)  Heavy metal pollution of sediments
沉积物重金属污染
4)  Metallicimpurity contaminant
金属杂质沾污
5)  metal deposit
金属沉积物<冶>
6)  metal deposition
金属沉积
1.
The analysis of metal deposition and micro-crystallites deposited by using CO_2 laser from aqueous solution;
CO_2激光诱导条件下的金属沉积层的微观分析
2.
Samples from different positions of S-RHT reactor were collected and metal deposition and distribution at the running catalysts were analyzed with ICP and SEM method.
采集了S-RHT反应器不同位置运转后的催化剂样品,利用ICP,SEM等手段对金属沉积及分布进行了剖析。
3.
Then it briefly illustrates the advantages and applications of laser assisted metal deposition.
本文介绍了激光增强金属电沉积与诱导金属无电沉积机理 ,比较了两种机理的区别与联系 ,简要说明了激光辅助金属沉积的特点和应
补充资料:沾污物
分子式:
CAS号:

性质:又称沾污物质,沾染物。进入环境中使环境介质的正常组成有所偏离,但不引起环境损害或生态效应的物质。如果会引起环境影响或生态效应的,则此物质称之为污染物。

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