1) Double exposure
二次曝光
1.
The double exposure fractional Fourier transform hologram (D EFRTH) is presented and analyzed in the paper.
提出了二次曝光分数傅里叶变换全息图 ,分析了它的性质 ,制作了二次曝光分数傅里叶变换全息图 ,讨论了其再现条件的特殊性和它的应
2.
By adopting double exposure technique, with a uniform phase mask and Gaussian laser beam being used, the uniform FBG used in DWDM system is designed and engraved, where, the bandwidth of the main reflection band at -50 dB is about 0.
采用高斯光束和均匀相位模版 ,用二次曝光技术 ,有效消除了均匀光纤光栅的反射谱旁瓣 ,所设计和刻制的光栅完全满足DWDM系统的要
3.
A method of single sensitivity is proposed to the displacement s measurement of double exposure.
提出一种单灵敏度下的二次曝光测位移。
2) double-exposure
二次曝光
1.
It discusses the required theory to study the stress field of the diffuser with double-exposure holographic interferomentry from tow ways.
从两个方面论述二次曝光全息技术研究应力场实验所需要的理论基础,第一个方面是论述全息照相技术的理论基础,第二个方面是论述了全息干涉计量学的相关理论,重点阐述二次曝光全息计量和漫射体全息干涉计量的基本理论。
2.
In double-exposure method for fabricating chirped fiber Bragg gratings, the mul ti-decaying-exponential relationship between photo-induced index increment of photosensitive fiber and its irradiating dose was considered and our self-desig ned software calculated nonlinear doubl-exposure profiles.
在利用二次曝光技术制作啁啾光纤Bragg光栅的方法中,把曝光扩大到光敏光纤感光特性曲线的非线性区,使得二次曝光法制作的啁啾光纤Bragg光栅的带宽和反射率大大提高。
3) Second exposure
二次曝光
1.
s:This paper intruduces a method of determination of matter refractive index from the speckle patten obtained by second exposure.
介绍了一种根据利用二次曝光技术获得的斑纹图样的光学特性测物质折射率的方法。
4) secondary exposure
二次曝光
1.
Nondestructive test for phase objects by secondary exposure laser holography;
位相物体激光全息二次曝光法无损检测
5) two-time exposal method
二次曝光法
1.
Temperature field measure using image plane hologram two-time exposal method;
用像面全息二次曝光法测量温度场的研究
6) Quadratic-exposure speckle charts
二次曝光散斑图
补充资料：输出反馈(见线性二次型次优控制)
输出反馈(见线性二次型次优控制)
output feedback
3h日c卜口fon以以{输出反馈型次优控制。(output王eedbaek)见线性二次
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条