1) range distribution and energy deposition distribution
射程分布和能量淀积分布
1.
It is analyzed that range distribution and energy deposition distribution of 15 keV nitroger or argon ions implantation in polyether sulfone film.
计算了 1 5 ke V N+和 Ar+注入聚醚砜薄膜的射程分布和能量淀积分布 ,利用计算的结果说明了离子注入聚醚砜膜后 ,薄膜表面电导率增加 (增加 5个数量级 )和光吸收率增加 (最大吸收率从44%增加到 82 。
2) distribution of the deposited energy
能量沉积分布
3) Momentum deposition depth distribution
动量空间淀积分布
4) range distribution
射程分布
1.
The computer simulation system for range distribution of ion implantation;
离子注入射程分布的计算机模拟系统
2.
Measurement of the range distribution and straggling of Er ions implanted in Si crystal
铒离子注入晶体硅的射程分布和离散研究
3.
In this paper, the integrated software system named JTU PRII (Jiaotong University Project Range of Ion Implantation), which is based on the transport theory and Monte Carlo method and is develped by ourselves for range distribution of ion implantation, is introduced.
介绍了自主开发的基于输运理论和蒙特卡罗方法的计算离子注入射程分布的软件集成系统JTU PRII(JiaotongUniversity ProjectRangeIonImplantation) ,该系统整体上具有通用性、高效性和实用性。
5) field emission energy distribution
场发射能量分布
1.
This paper summarizes the results about emission mechanisms of CNTs during the past 10 years, including issues of field emission energy distribution (FEED), work function, emission models and emission stability.
较全面地介绍了碳纳米管场发射研究10年来在发射机理方面的研究结果,包括场发射能量分布、逸出功、发射模型以及发射稳定性和失效等问题,并介绍了相关方面的研究结果。
6) distribution of radiant energy
光辐射能量分布
补充资料：广义能量积分
见拉格朗日方程。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条