1) aliphatic glycidyl ether acrylic acid ester
脂肪烃缩水甘油醚丙烯酸酯
1.
In order to study the brittleness and big shrinkage of photosensitive resin's curable system, a type of active diluents for photosensitive resin--aliphatic glycidyl ether acrylic acid ester was synthesized.
针对光敏树脂固化物涂层性脆且收缩率较大的问题,合成了一种光敏树脂稀释剂———长链脂肪烃缩水甘油醚丙烯酸酯。
2) aliphatic glycidyl ether
脂肪烃缩水甘油醚
1.
In order to study the brittleness and big shrinkage of photosensitive resin's curable system, a type of active diluents for photosensitive resin--aliphatic glycidyl ether acrylic acid ester was synthesized.
针对光敏树脂固化物涂层性脆且收缩率较大的问题,合成了一种光敏树脂稀释剂———长链脂肪烃缩水甘油醚丙烯酸酯。
3) glycerin triglycidyl ether triacrylate
丙三醇三缩水甘油醚三丙烯酸酯
1.
A novel photosensitive prepolymer glycerin triglycidyl ether triacrylate was synthesized using glycerin triglycidyl ether and acrylic acid as main raw materials,N,N-dimethylbenzylamine as catalyst and p-hydroxyanisole as inhibitor.
以N,N 二甲基苄胺为催化剂、对羟基苯甲醚为阻聚剂,用丙三醇三缩水甘油醚和丙烯酸为主要原料合成了一种新型光敏预聚物———丙三醇三缩水甘油醚三丙烯酸酯。
4) polypropylene glycol diglycidylether diacrylate
聚丙二醇二缩水甘油醚二丙烯酸酯
1.
A photosensitive oligomer of polypropylene glycol diglycidylether diacrylate was prepared by polypropylene glycol diglycidylether and acrylic acid as two main materials.
用聚丙二醇二缩水甘油醚作为原料与丙烯酸反应,合成聚丙二醇二缩水甘油醚二丙烯酸酯,较好的合成条件是反应温度宜控制在100℃~110℃,催化剂N,N-二甲基苄胺的质量分数为0。
5) polyethyleneglycol diglycidyl ether diacrylate
聚乙二醇二缩水甘油醚二丙烯酸酯
6) butyl glycidylether acrylate
丁基缩水甘油醚丙烯酸酯
1.
Synthesis of photosensitive diluent of butyl glycidylether acrylate;
丁基缩水甘油醚丙烯酸酯光敏稀释剂的合成
补充资料：缩水甘油丁酸酯
分子式：C7H12O3
分子量：144.17
CAS号：60456-26-0
性质：密度1.035。沸点192.6°C。折射率1.427-1.429。闪点90°C。比旋光度-30° (c=neat)。水溶性insoluble。
分子量：144.17
CAS号：60456-26-0
性质：密度1.035。沸点192.6°C。折射率1.427-1.429。闪点90°C。比旋光度-30° (c=neat)。水溶性insoluble。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条