1) EA-CVD
EA-CVD方法
1.
In this paper, diamond films have been grown by EA-CVD (Electron assisted Chemical Vapor Deposition) method, and states of nitrogen impurity contained in diamond films were studied by Raman spectroscopy, IR spectroscopy, fluorescence spectroscopy and EPR spectroscopy.
实验结果表明,用EA-CVD方法制备的金刚石膜中氮杂质主要是以Ns0、Ns+、[N-V]0和[N-V]-1的形式存在,没有检测到在天然金刚石和高温高压金刚石中常见的A和B中心形式存在的氮杂质。
2) EA-CVD
EA-CVD
1.
Studies for quality and thickness uniformity of diamond thick film synthesized by the EA-CVD method;
用EA-CVD方法制备的大尺寸金刚石厚膜的品质和膜厚均匀性的研究
补充资料:EA
分子式:C2H7N
分子量:45.08
CAS号:75-04-7
性质:密度0.8。熔点-81°C。沸点17°C。折射率1.383-1.385。闪点-17°C。水溶性miscible。
分子量:45.08
CAS号:75-04-7
性质:密度0.8。熔点-81°C。沸点17°C。折射率1.383-1.385。闪点-17°C。水溶性miscible。
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