2) chemical solution deposition
化学溶液法
1.
BLT thin films were prepared on P-type Si(100) substrates by chemical solution deposition(CSD).
用化学溶液法在P-S i(100)衬底上制备出了一系列不同退火温度的B i3。
2.
3MnO3(LSMO) thin films are fabricated by chemical solution deposition(CSD) method on LaAlO3(100) single crystal substrates.
在LaAlO3(100)单晶上,通过化学溶液法(CSD)制备了有取向性的La0。
3) chemical solution route
化学溶液法
1.
Bulk samples of La2NiMnO6+δ oxides were synthesized in air by solid state reaction and chemical solution route.
分别利用固态反应法和化学溶液法制备了La2NiMnO6+δ氧化物块材。
2.
The chemical solution route is employed to synthesize powder and bulk samples of La2CuMnO6 oxide in air and the as-synthesized samples are compared with those prepared by the solid state reaction route.
利用化学溶液法制备了La2CuMnO6氧化物粉体和块材,并与固态反应法所制得的样品作了比较。
4) solution chemical method
溶液化学法
1.
Studies on the Preparation and Properties of ZnO Nanorod Thin Films by Solution Chemical Method;
ZnO纳米棒晶薄膜的溶液化学法制备与性能研究
5) Chemical solution reaction
溶液化学反应法
6) chemical solution deposition
化学溶液分解法
1.
5)Ti_3O_(12) thin films have been grown on Si substrates by a chemical solution deposition method.
采用化学溶液分解法(CSD)在S i衬底上制备了Sm0。
2.
1)2Ti2O7 thin films were prepared on p-Si(111) substrates by a chemical solution deposition method.
采用化学溶液分解法(CSD)在p-Si(111)衬底上制备了(Bi0。
3.
8Ti2O7 thin films have been prepared on p-Si(111) substrates by a chemical solution deposition method.
采用化学溶液分解法(CSD)在p型Si(111)衬底上制备了Nb0。
补充资料：容量分析法(见化学分析法)
容量分析法(见化学分析法)
容t分析法见化学分析法
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条