1) Tungsten coating
钨涂层
1.
Gas desorption behavior of plasma facing material for tungsten coating
钨涂层面对等离子体材料出气性能的研究
2.
Surface characterization and microstructure studies are performed on chemical vapor deposited(CVD) tungsten coating .
CVD氯化(x/2Cl2+WWClx(970℃);WClx+x/2H2W+xHCl(900℃))沉积的钨涂层允许有100/111/110择优取向。
3.
Surface characterization and microstructure studies are performed on chemical vapor deposited (CVD) tungsten coating.
研究CVD钨涂层的表面形貌和结构、断面性能、涂层的抗热震性能及高温扩散性能。
2) tungsten coatings
钨涂层
1.
The result of the high temperature diffusion experiment shows that the diffusion rate from molybdenum substrate to tungsten coatings is faster than that from the coatings to the subs.
采用CVD(chemical Vapor Deposition)法沉积的钨涂层有[100]／[111]／[110]择优取向。
2.
Tungsten coatings of 0.
8～ 1mm厚的钨涂层和含有 0 。
4) Ta/W composite coating
钽/钨复合涂层
5) tungsten coated pyrolytic graphite tube
钨涂层热解管
补充资料：蓝钨氢还原(见仲钨酸铵氢还原)
蓝钨氢还原(见仲钨酸铵氢还原)
hydrogen reduction of blue tung sten compound
Ianwu qing huanyuan蓝钨氮还原(hydrogen reduetion of bluetungsten compound)见仲钨酸按氮还原。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条