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1)  TiN/Si_3N_4 films
TiN/S3N4薄膜
2)  TiN film
TiN薄膜
1.
Influence of shield on properties of TiN films prepared by arc ion plating;
挡板对电弧离子镀TiN薄膜性能的影响
2.
Application of Oxidation Processing in TiN films Deposited by Vacuum Arc——A Practice of Combining Professional Courses with Science Program;
氧化工艺在真空电弧沉积TiN薄膜中的应用——专业课程与课题相结合的实践
3.
In the study, the authors prepare a layer of TiN film on carbide matrix by using hot cathode ion plating techniques.
利用热阴极离子镀技术改变主弧电流,控制镀膜时间等参数,在硬质合金基体上制备了TiN薄膜;利用XRD、自动划痕仪、SEM和显微硬度计对所制备的样品进行了结构分析和性能检测。
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3)  TiN films
TiN薄膜
1.
The influence of magnetron sputtering TiN films processing parameters on microhardness;
磁控溅射TiN薄膜工艺参数对显微硬度的影响
2.
Preparation and properties of TiN films on ZL109 aluminum alloy by multi-arc ion plating
ZL109铝合金表面多弧离子镀TiN薄膜的制备及性能
3.
Tribological properties of TiN films under different testing conditions
不同测试条件下TiN薄膜的摩擦学特性研究
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4)  TiN/AIN thin film
TiN/AlN薄膜
5)  TiN thin film
TiN薄膜
1.
The nanohardness,adhesion strength to substrate,friction coefficients and tribological properties of the TiN thin films were studied.
用中频磁控溅射镀膜机制备得到了各种厚度不同的TiN薄膜,研究了TiN薄膜的纳米硬度、膜基结合力、摩擦系数以及综合摩擦磨损性能。
2.
The preparation technology and development of TiN thin film were reviewed.
综述了TiN薄膜的制备方法及进展,介绍了物理气相沉积、化学气相沉积、等离子化学气相沉积及光化学气相沉积等各种TiN薄膜的制备方法,评述了各种制备工艺的优缺点。
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6)  TiN coating
TiN薄膜
1.
The cavitation erosion process and mechanism were analyzed, and the influence of the hardness and thickness of the TiN coating on the cavitation-erosion performance was explored.
采用自制磁致伸缩式空蚀磨损试验机考察了冷阴极离子镀TiN薄膜的空蚀磨损性能,分析了TiN镀层的空蚀磨损过程及机理,探讨了TiN镀层硬度和厚度对其空蚀磨损性能的影响。
2.
For thinner TiN coating,micro-pits become larger and some of micro-pits connect with each other,while fatigue micro-cracks generat.
采用物理气相沉积工艺在高速钢表面沉积TiN薄膜,研究了TiN薄膜的疲劳磨损过程。
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补充资料：BIS(2-aminobenzoato-O,O')dibutyl-Tin Tin,BIS(2-aminobenzoato-O,O')dibutyl-
CAS：65555-32-0
中文名称：二(2-氨基苯甲酸基-O,O')二丁基锡
英文名称：BIS(2-aminobenzoato-O,O')dibutyl-Tin Tin,BIS(2-aminobenzoato-O,O')dibutyl-
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
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