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1)  zirconium [英][zə:'kəuniəm]  [美][zɚ'konɪəm]
纯锆
1.
Surface study of zirconium implanted with yttrium and lanthanum;
纯锆上离子注入钇和镧后的表面分析
2.
In order to study the effect of carbon ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted with carbon ions with fluence ranging from 1×1016 ions/cm2 (1E16C) to 1×1017 ions/cm2, using a metal vapor vacuum arc source (MEVVA) at an extraction voltage of 40 kV.
为了研究碳离子注入对纯锆耐蚀性的影响,用MEVVA源对纯锆样品进行了1×1016ions/cm2至1×1017ions/cm2的碳离子注入,注入加速电压为40kV。
3.
In order to study the influence of lanthanum ion implantation on the oxidation behavior, zirconium specimens were implanted at a dose range from 1×1016ions/cm2 to 1×1017 ions/cm2 using MAVVA source at extracted voltage of 40 kV.
纯锆表面注入了1×10~(16)ions/cm~2~1×10~(17)ions/cm~2的镧离子,并在500℃条件下进行了空气氧化增重研究。
2)  Sponge Zirconium of Nuclear Purity
核纯锆
3)  high purity zirconium
高纯锆
4)  Nuclear-pure spongy Zr
核纯海绵锆
5)  high purity zirconium dioxide
高纯二氧化锆
1.
Determination of trace rare earth impurities in high purity zirconium dioxide by inductively coupled plasma mass spectrometry after separation by solvent extraction;
萃取分离基体-电感耦合等离子体质谱法测定高纯二氧化锆中痕量稀土杂质
6)  highpurity zirconium oxychloride
高纯氧氯化锆
1.
Polyacrylamide type flocculants have been used in the secondary removal of silicon in preparation of highpurity zirconium oxychloride.
高纯氧氯化锆是制取高纯锆化学品的重要原材料,目前国内外多采用锆英石为原料碱熔法生产,硅的去除分两步进行:第1步是用水浸洗碱熔分解产物,大约有85%~90%的硅以硅酸钠的形式进入水浸液,余下SiO2需要“二次除硅”。
补充资料:纯纯
1.诚挚貌。
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