1) gas base fluid
气基流体
1.
This paper discussed the conversion technology of gas drilling-the conversion of drilling fluids from gas base fluids to gas fluids,from gas fluids to water base fluids,and the direct conversion from gas base fluids to water base fluids,and the maintenance of drilling fluids after the conversion.
论述了由气基流体转化为气体型流体、由气体型流体转换为水基钻井液、气基流体直接转换为水基钻井液的工艺配套技术,以及替浆后的水基钻井液性能维护处理等工艺技术。
2) gaseous fluid
气体流体
3) general gas flow equation
气体流动基本方程
1.
Integrated application of general gas flow equation and Colebrook-White friction factor expression;
气体流动基本方程与Colebrook-White摩擦阻力公式的综合应用
4) basic current
基本气流
1.
By using a quasigeostrophic barotropic model, five experiments whose integration timesare 72 model days were Performed in order to study effects of various basic currents on evolutionalcharacteristics of local flow patterns which are responsible for the regional drought.
用一个β平面准地转正压模式，实施了５组时间积分为７２个模式日的试验，分析了不同基本气流对局域流型演化特征的作用。
5) Gas flow rate
气体流量
1.
MWNT were deposited with different gas flow rate so as to systematically investigate the effect of environment on the growth behavior of MWNT.
用化学气相沉积法裂解乙炔制备无序多壁碳纳米管,以Fe/S iO2粉状物作为催化剂,考察了气体流量等环境因素对碳纳米管生长的影响。
2.
The parameters that affect the concentration of the generated ozone,such as the geometry of electrode system,gas flow rate,discharge time,discharge voltage,peak current and voltage of electrodes and the content of oxygen,were discussed,respectively.
研究了电极结构、气体流量、放电时间、放电电压、各电极的电流电压峰值、是否添加氧气等与产生臭氧浓度之间的关系。
3.
For reactive sputtering,the gradient films with varying ratio of chemical component can be prepared by changing gas flow rate continuously.
对于反应溅射,可通过连续改变反应气体流量制得化学成分比连续变化的梯度薄膜。
6) gas convection
气体对流
1.
The degree of gas convection can be characterised by the Rayleigh number (Re)and the degree of heat-transfer by gas convection can be characterised by Nusselt number( Nu ) in the crystal growth of oxides by means of CZ method.
引上法生长高温氧化物晶体时，热腔中的气体对流状态由雷诺数（Ｒｅ）决定，气体对流传热由努赛尔数（Ｎｕ）决定。
补充资料：2-甲氧基碳酸基乙基胺基乙基胺基丙基三甲氧基硅烷
CAS: 1067-66-9
分子式: C12H28N2O5Si
分子量: 308.45
中文名称: 2-甲氧基碳酸基乙基胺基乙基胺基丙基三甲氧基硅烷
英文名称: [N'-(2-Methoxycarbonylethyl)aminoethylaminopropyl]trimethoxysilane
10-diaza-3-silatridecan-13-oic acid, 3,3-dimethoxy-2-oxa- methyl ester
n-(2-((3-(trimethoxysilyl)propyl)amino)ethyl)-beta-alanin methyl ester
methyl 3,3-dimethoxy-2-oxa-7,10-diaza-3-silatridecan-13-oate
methyl[2-(3-trimethoxysilylpropylamino)-ethylamino
分子式: C12H28N2O5Si
分子量: 308.45
中文名称: 2-甲氧基碳酸基乙基胺基乙基胺基丙基三甲氧基硅烷
英文名称: [N'-(2-Methoxycarbonylethyl)aminoethylaminopropyl]trimethoxysilane
10-diaza-3-silatridecan-13-oic acid, 3,3-dimethoxy-2-oxa- methyl ester
n-(2-((3-(trimethoxysilyl)propyl)amino)ethyl)-beta-alanin methyl ester
methyl 3,3-dimethoxy-2-oxa-7,10-diaza-3-silatridecan-13-oate
methyl[2-(3-trimethoxysilylpropylamino)-ethylamino
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条