1) polishing efficiency
抛光效率
1.
The result indicated that there were several factors that influence the polishing efficiency,including grind granule,positive pressure and rotate speed.
通过对机械抛光后的YAG表面进行了研究,结果表明:合理优化工艺参数,可获得较好的面形和较低的粗糙度,影响抛光效率的因素为磨粒、正压力和转速。
2.
The effect of the controllable polishing parameters such as electrical potential, polishing clearance and polishing time on the polishing efficiency is discussed as well.
本文介绍了电泳抛光技术在功能陶瓷表面加工中的应用,并在自行改装的电泳抛光机上对半导体硅板进行了抛光试验,获得了电压、抛光间隙、抛光时间对抛光效率的影响规律,为电泳抛光技术的深入应用奠定了基础。
2) removal efficiency
抛光效率
1.
Compared the surface roughness and removal efficiency with the diversity magnetic field intensity,proceed magnetorheological finishing,combined magnetic field intensity is used to polish the material of K9 flat glass of roughness(Ra) 400 nm f.
比较了不同磁场强度下的磁流变抛光情况,以及表面粗糙度和抛光效率的差别,然后,通过采用不同磁场强度组合加工,使初始表面粗糙度(Ra)为400 nm的K9玻璃材料的平面,磁流变抛光30 min,表面粗糙度值达到了0。
3) electrochemical polishing/machining efficiency
电化学抛光/加工效率
5) polish rate
抛光速率
1.
The different polish rate for different polish material cause dishing.
碟形是由于在抛光过程中铜线与介质层不同的抛光速率所导致。
6) polishing rate
抛光速率
1.
The influence of the pressure,polishing temperature,oxidant concentration and slurry flow rate on polishing rate was discussed.
采用二氧化硅胶体碱性抛光液对铜布线进行抛光,讨论了抛光压力、温度、氧化剂含量、流量等对抛光速率的影响。
2.
The mechanism of W-CMP was analyzed,the slurry makes a dual function of chemical erosion and mechanical lapping,has an important influence on the polishing rate.
分析了W-CMP的机理,抛光液对W材料表面具有化学腐蚀和机械研磨的双重作用,对抛光速率有着重要的影响。
3.
To reduce the roughness and keep agreeable polishing rate,different polishing processes were needed,the hardness of polishing pad and the particle diameter of silicon dioxide in slurry should be reduced gradually,and the pH of slurry should be kept at appropriate range.
研究了化学机械抛光过程中抛光布、抛光液中SiO2溶胶粒径、pH值以及清洗工艺对GaAs抛光片表面粗糙度的影响,为降低粗糙度而保持一定的抛光速率,应尽量采用多步抛光的方式,逐步降低抛光布的硬度和SiO2溶胶粒径,抛光液的pH值也要在合适的范围。
补充资料：抛光剂,抛光混合剂
CAS：68909-13-7
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条