1) TiB2 coating
TiB2镀层
1.
TiB2 coating was electrodeposited on graphite substrate from K2TiF6-KBF4-KF-KCl-LiF molten salts at 820 ℃ for 3 hr with a current density 0.
介绍了采用K2TiF6-KBF4-KF-KCl-LiF熔盐体系在石墨基体上电沉积制备TiB2镀层的工艺方法,其电解质组成(质量分数,%)为K2TiF615,KBF424,KF48,KCl 8,LiF5,电沉积温度为820℃,电沉积时间为3 h,电流密度为0。
2) Ni-TiB_2 composite coating
Ni-TiB2复合镀层
1.
Ni-TiB_2 composite coatings were deposited on stainless steel by electrodepositon from nickel sulfate bath containing TiB_2 particles.
用复合电沉积方法制备Ni-TiB2复合镀层。
3) TiB_2 coating
TiB2涂层
1.
TiB_2 coatings were prepared by radio-frequency magnetron sputtering technique on the substrates of steel and silicon.
利用射频磁控溅射技术在硅和钢片上沉积了TiB2涂层。
2.
TiB_2 coatings were prepared by radio-frequency magnetron sputtering technique on the substrates of cold-working steel.
利用射频磁控溅射技术在冷作模具钢片上沉积了TiB2涂层。
3.
An apparatus for modified Rapoport test was applied to test the sodium expansion of semi-graphitic block sample and ambient temperature cured TiB_2 coating cathode samples with different TiB_2 content, and the section specimen after electrolysis was observed and analyzed by scanning electron microscope and energy dispersive spectrometer.
研究结果表明:TiB2涂层阴极的钠膨胀率小于半石墨质阴极的钠膨胀率;随着涂层中TiB2含量的增加,涂层阴极的钠膨胀逐渐减缓,最终钠膨胀率逐渐减小;TiB2含量为60%的涂层阴极的最终钠膨胀率最小,约为半石墨质阴极的最终纳膨胀率的60%;在电解初期,渗透进入TiB2涂层阴极的钠主要集中在涂层中,TiB2涂层本身也是钠渗透进入碳素阴极的阻挡层;常温固化TiB2阴极涂层能提高基体碳素阴极材料抗钠渗透性,减小钠膨胀危害,降低阴极破损率。
4) TiB_2 Ni composite coating
TiB2-Ni涂层
5) TiC-TiB2 composite coating
TiC-TiB2涂层
6) TiB2 Cathode coatings
TiB2阴极涂层
1.
The solidification of TiB2 Cathode coatings using XD26 under ambient temperature is the technology jointly developed by Shanxi Guanlu Aluminum Co.
介绍山西关铝股份有限公司与中南大学联合开发的“XD26常温固化TiB2阴极涂层” 技术和该技术的工业应用及应用效果,着重论述了该技术及其材料的技术特性。
补充资料：磁性镀层
分子式：
CAS号：
性质：用于提高某些金属或非金属零件的磁性要求的电镀层。如录音机或电子计算机等设备中的录音带、磁环线、记忆鼓等储存系统，一般镀镍铁、镍钴、镍铬磷等合金。通过改变电镀工艺参数，可获得不同性能的磁性镀层。
CAS号：
性质：用于提高某些金属或非金属零件的磁性要求的电镀层。如录音机或电子计算机等设备中的录音带、磁环线、记忆鼓等储存系统，一般镀镍铁、镍钴、镍铬磷等合金。通过改变电镀工艺参数，可获得不同性能的磁性镀层。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条