1) 2-deoxy-L-ribose
2-脱氧-L-核糖
1.
Improvement synthesis of 2-deoxy-α-1,3,4-O-phenyl-L-arabopyranose,an intermediate of 2-deoxy-L-ribose
2-脱氧-L-核糖重要中间体2-脱氧-α-1,3,4-O-苯甲酰-L-阿拉伯吡喃糖的合成工艺改进
2.
The various synthetic methods for the synthesis of 2-deoxy-L-ribose and their recent advances were reviewed,and synthetic methods were discussed in detail employing sugar or its derivatives as starting materials such as:1)L-arabinose;2)D-xylose;3)D-galactose;4)L-ascorbic acid;5)D-glucono-1,4-lactone.
2-脱氧-L-核糖是合成L-核苷类抗病毒药物的重要中间体。
3.
The synthetic methods of 2-deoxy-L-ribose were reviewed as follows: (1) reductive deoxygena- tion of pentose, (2) degradative deoxygenation of hexose, (3) diastereoselective addition of α,β-unsaturated lactone, (4) stereoselective condensation of small molecules, and (5) asymmetric epoxidation.
综述了2-脱氧-L-核糖的合成方法概况:(1)五碳糖的还原脱氧;(2)六碳糖的降解脱氧;(3)α,β-不饱和内酯的非对映选择性加成;(4)高立体选择性的小分子间缩合;(5)不对称环氧化。
2) D-2-Deoxyribose
2-脱氧核糖
3) 2-deoxy-D-ribose
D-2-脱氧核糖
1.
Research Progress in the Synthesis of 2-deoxy-D-ribose;
D-2-脱氧核糖的合成研究进展
4) D-2-Deoxyribose
2-脱氧-D-核糖
5) phosphoric acid skeleton structure
脱氧核糖
1.
The DNA damage effect induced by He-Ne laser was analyzed from DNA phosphoric acid skeleton structure and conformation,desoxyribose and phosphoric acid-desoxyribose as well as basic group.
从DNA的磷酸骨架基团和构象、脱氧核糖和磷酸-脱氧核糖以及碱基三个方面分析了激光对DNA损伤的效应。
6) 2-deoxysugars
2-脱氧糖
补充资料:2-脱氧-L-核糖
分子式:C5H10O4
分子量:134.13
CAS号:18546-37-7
性质:熔点69-72°C。比旋光度57° (c=0.9 H2O after 24h)。
分子量:134.13
CAS号:18546-37-7
性质:熔点69-72°C。比旋光度57° (c=0.9 H2O after 24h)。
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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