1) VO_x molecule
VO_x分子
2) VO_x films
VO_x薄膜
1.
The VO_x films were deposited on the glass substrates by using a RF magnetron reactive sputtering method with different O_2/Ar flow ratios at the same sputtering air pressure.
溅射总气压一定,通过改变氧氩气体的比例,用射频磁控反应溅射法在玻璃衬底上制备VO_x薄膜。
3) VO_x nanotubes
VO_x纳米管
4) VO_x/SiO_2 catalyst
VO_x/SiO2催化剂
5) VO_X/LaF_3 catalyst
VO_X/LaF_3催化剂
6) VO_x/SiO_2 catalysts
VO_x/SiO_2催化剂
1.
VO_x/SiO_2 catalysts with different VO_x loading was prepared with the calcination temperature 550℃, using SiO_2 as support.
本论文采用SiO_2为载体,以VO_x为活性组分,在焙烧温度为550℃条件下制备了不同钒负载量的VO_x/SiO_2催化剂。
补充资料：(beta-4)-vanadate (vo43-tripotassium
CAS：14293-78-8
分子式：K3VO4
中文名称：钒酸三钾
英文名称：tripotassium, (T-4)-Vanadate；Potassium vanadate (ortho)；(beta-4)-vanadate (vo43-tripotassium；Vanadate,tripotassium,(T-4)-；Potassium vanadate(ortho)
分子式：K3VO4
中文名称：钒酸三钾
英文名称：tripotassium, (T-4)-Vanadate；Potassium vanadate (ortho)；(beta-4)-vanadate (vo43-tripotassium；Vanadate,tripotassium,(T-4)-；Potassium vanadate(ortho)
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条