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1)  trivalent chromium plating
三价铬电镀
1.
Electrochemical behavior of oxide-coated Ti electrode for trivalent chromium plating;
三价铬电镀用氧化物涂层钛电极的电化学行为
2.
In this paper, three types of bath for trivalent chromium plating are gained: chloride-glycine bath, chloride-U bath and sulfate-oxalic bath.
本文研究得到的三种三价铬电镀体系:氯化物-氨基乙酸体系、氯化物-U体系及硫酸盐-草酸体系。
3.
A new trivalent chromium plating process using formate-carboxylic acid salt as complexing agents is studied in this paper.
本文新近研究了一种以甲酸盐-羧酸盐作为络合剂的三价铬电镀新工艺,并对该溶液和镀层进行了性能测试。
2)  trivalent chromium electroplating
三价铬电镀
1.
A process for trivalent chromium electroplating in sulphate system was established.
开发了一种硫酸盐体系三价铬电镀铬工艺,确定了其所使用的阳极,并将所获得的产品相关性能参数与国外同类产品进行了对比。
2.
At present, trivalent chromium electroplating process has became one of the mostimportant techniques to taking place of the seriously pollutional hexvalent chromiumelectroplating process.
目前,三价铬电镀工艺已经成为取代重污染六价铬电镀的最重要技术之一。
3)  trivalent chrome plating
电镀三价铬
4)  black trivalent chromium electro-plating
三价黑铬电镀
5)  trivalent chromium electroplating solution
三价铬电镀液
6)  trivalent chromium sulfate plating
三价铬镀铬
1.
The influence of impurity of Cu2+, Zn2+, Ni2+and Fe2+ (content of 50 mg/kg) on deposit’s appearance, thickness and bath’s polarization was discussed in process of trivalent chromium sulfate plating.
研究了硫酸盐三价铬镀铬工艺中铜、锌、铁、镍离子(含量均为50mg/kg)对镀层外观和厚度、镀液极化的影响,比较了不同除杂方法的除杂效果。
补充资料:无孔电镀铬
分子式:
分子量:
CAS号:

性质:见电镀铬。

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